MS4651: Thin Film Technology

Academic Units3
Semester1
Pre-requisite(s)Nil
Co-requisite(s)Nil

Course Instructors

Associate Professor Xue Can

Course AIMS

This course aims at developing comprehensive understanding on thin film deposition principles and techniques. You will gain a fundamental view on the thin film growth process as well as the microstructure that has been developed during the deposition process. The course will help you develop the skills to design thin film systems and select appropriate deposition techniques based upon materials composition, microstructures and properties.

Intended Learning Outcomes

By the end of this course, you (as a student) would be able to:   

  1. Explain the molecular behaviours in different vacuum conditions for gas-phase deposition techniques of thin films.
  2. Propose appropriate deposition methods for a targeting thin film structure with desirable properties.
  3. Explain the principles of different film deposition techniques.
  4. Describe the general thin film growth process and evaluate the microstructure evolution during deposition.
  5. Choose the right tools to perform thickness measurement of different thin films and characterize their optical properties.

Course Content

Vacuum, physical vapor deposition (evaporation and sputtering), chemical vapor deposition, thin film growth and microstructure, epitaxy, liquid phase deposition, characterization methods, thin film properties.

Reading and References

Suggested reading:

  • M. Ohring, The Materials Science of Thin Films, 2nd Edition, 2001, Academic press
  • D. L. Smith, Thin-film deposition, principles and practice, 1995, McGraw-Hill
  • K. Seshan, Handbook of Thin-Film Deposition Processes and Techniques, 2002, William Andrew Publishing
  • K. S. Sree Harsha, Principles of Vapor Deposition of Thin Films, 2006, Elsevier